2015-09-29
Core tip: the semiconductor industry has entered the 14nm process, the beginning of mass production in 2014. If from the process node, conventional optical lithography 193 nm immersion by twice or four times graphics exposure (DP) technology could reach up to 10 nm, which means that if the EUV technology once again postpone the application, to 2015 process will be temporarily in the 10 nm wandering.